PROCESS APPLICATIONS
Thick Film
After a paste is screened onto a substrate and it settles for 5-15 minutes at room temperature, it undergoes oven drying at 100-150ˇăC for 10-15 minutes to remove solvents. Firing is then completed in conveyor belt furnaces at temperatures between 500-1000ˇăC.
Recommendations:
HSG Series Thick Film Drying Furnace
HSK Series Thick Film Firing Furnace
Thin Film Solar Cells
A transparent conducting glass, coated with doped SnO2 or ITO film, is used as a substrate. A thin film, such as CdS, is then deposited through CSS or CBD techniques. The CdS film is heat treated in a reducing atmosphere or in the presence of CdCl2 at 400-500ˇăC.
Recommendations:
HSG Series Photovoltaic Drying Furnace
HSH Series Photovoltaic Fast Response Furnace
Crystalline Silicon Solar Cell
Electrical contacts are usually formed by screen printing. The firing is done in conveyor belt furnaces at a temperature of about 700ˇăC for a few minutes. Upon firing, the organic solvents evaporate and the metal powder becomes a conducting path for the electrical current.
Recommendations:
HSG Series photovoltaic Drying Furnace
HSH Series Photovoltaic Fast Response Furnace
Dye Sensitized Solar Cells (DSSC)
TiO2 nanoparticles have been used extensively to increase the interfacial surface area in Dye Sensitized Solar Cells. Nanoparticle films are generally made by screen printing a paste of titania nanocrystals and then sintering the particles together at 450-500ˇăC.
Recommendations:
HSG Series Photovoltaic Drying Furnace
HSK Series Photovoltaic Fast Response Furnace
HSH Series Photovoltaic Fast Response Furnace